High-Power-Density Plasma Deposition of Diamond-Like
Carbons Films

Chin. Phys. Lett.

1994, Vol. 11

Issue (9): 558-560 DOI:

Original Articles

High-Power-Density Plasma Deposition of Diamond-Like Carbons Films

YAN Pengxun;YANG Si-ze;YANG Jie;LI Qing;LI Bing;LIU Chizi;CHEN Xishen

Institute of Physics, Academia Sinica, Beijing 100080

Cite this article:

YAN Pengxun, YANG Si-ze, YANG Jie et al 1994 Chin. Phys. Lett. 11 558-560

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Abstract We present a new method utilizing a high-power-density plasma for depositing diamond-like carbon (DLC) films. The main advantage of this technique is the possibility that films with good adhesion to the substrate can be prepared under room temperature and low pressure. The DLC films are deposited on the silicon substrate successfully. The structure of the DLC films was characterized by high energy electron diffraction, scanning electron microscopy, Raman spectroscopy, x-ray photoelectron spectroscopy, and infrared absorption spectrum.

Keywords: 52.75.-d 68.55.–a

Published: 01 September 1994

PACS:	52.75.-d	(Plasma devices)
	68.55.–a

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1994/V11/I9/0558

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	YAN Pengxun
	YANG Si-ze
	YANG Jie
	LI Qing
	LI Bing
	LIU Chizi
	CHEN Xishen

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