Photoabsorption Spectra of Nano-Crystalline Silicon Films

Chin. Phys. Lett.

1993, Vol. 10

Issue (12): 752-755 DOI:

Original Articles

Photoabsorption Spectra of Nano-Crystalline Silicon Films

LIU Xiangna;HE Yuliang;F. Wang^*;R. Schwarz^*

Department of Physics, and Laboratory of Solid State Microstructures, Nanjing University, Nanjing 201800 ^*Department of Physics El6, T. U. Munich, F. R. Germany

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LIU Xiangna, HE Yuliang, F. Wang et al 1993 Chin. Phys. Lett. 10 752-755

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Abstract The photoabsorption spectra of nano-crystalline silicon (nc-Si :H) films were measured by means of constant photoconductivity method. We investigated the changes of absorption spectra with the increasing of crystallinity as the deposited films are amorphous, microcrystalline and nano-crystalline. We found that in nc-Si : H the transition processes in the interfacial region between the grains predominate the whole range of the absorption spectra. We related the phenomenon to the structural changes in the material.

Keywords: 73.50.Pz 72.80.Ng

Published: 01 December 1993

PACS:	73.50.Pz	(Photoconduction and photovoltaic effects)
	72.80.Ng	(Disordered solids)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1993/V10/I12/0752

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	LIU Xiangna
	HE Yuliang
	F. Wang
	R. Schwarz

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