Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System

Chin. Phys. Lett.

1992, Vol. 9

Issue (7): 359-362 DOI:

Original Articles

Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System

PENG Gongwen*;TIAN Decheng

*Institute of Physics, Academia Sinica, Beijing 100080 Department of Physics, Wuhan University, Wuhan 430072, And International Center for Materials Physics, Academia Sinica, Shenyang 110015

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PENG Gongwen, TIAN Decheng 1992 Chin. Phys. Lett. 9 359-362

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Abstract We extend the diffusion-limited aggregation model of Witten and Sander to the electrochemical deposition system by considering the effects of the external electric field. A jump probability for field-biased-diffusion is reasonably deduced, which enables us to obtain a series of loopless random fractals with varying fractal dimensions.

Keywords: 64.60.Ak 82.20.Wt

Published: 01 July 1992

PACS:	64.60.Ak
	82.20.Wt	(Computational modeling; simulation)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1992/V9/I7/0359

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	TIAN Decheng

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