GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR DEPOSITION

Chin. Phys. Lett.

1990, Vol. 7

Issue (10): 445-448 DOI:

Original Articles

GROWTH OF DIAMOND-LIKE FILMS BY DC PLASMA CHEMICAL VAPOR DEPOSITION

ZHAN Rujuan;GAO Kelin;ZOU Zuping;WANG Yanxia;LIU Jiezhou;XIANG Zhilin;LIU Hongtu¹;WU Zhiqiang¹;YE Jian¹;ZHOU Guien²;WANG Changsui²

Department of Modern Physics University of Science and Technology of China, Hefei 230026 ¹Department of Physics University of Science and Technology of China, Hefei 230026 ²Structure Research Laboratory. University of Science and Technology of China, Hefei 230026

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ZHAN Rujuan, GAO Kelin, ZOU Zuping et al 1990 Chin. Phys. Lett. 7 445-448

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Abstract Diamond-like films have been deposited by dc plasma chemical vapor deposition (CVD). During deposition, the characteristics of the plasma have been measured by means of the Langmuir single probe. The structure of the deposits has been studied by X-ray diffraction, Raman spectroscopy and Fourier transform infrared spectroscopy.

Keywords: 52.40.Hf 52.80.Hc 81.15.Gh

Published: 01 October 1990

PACS:	52.40.Hf	(Plasma-material interactions; boundary layer effects)
	52.80.Hc	(Glow; corona)
	81.15.Gh	(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1990/V7/I10/0445

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	ZHAN Rujuan
	GAO Kelin
	ZOU Zuping
	WANG Yanxia
	LIU Jiezhou
	XIANG Zhilin
	LIU Hongtu
	WU Zhiqiang
	YE Jian
	ZHOU Guien
	WANG Changsui

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