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THE GROWTH OF e-BEAM EVAPORATED POLYCRYSTALLINE NICKEL FILM |
| ZHENG Tianshui;SHEN Yuanhua;WANG Wencheng;ZHANG Zhiming;WANG Zhijiang* |
| Laboratory of Laser Physics and Optics, Fudan University, Shanghai
*Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, Shanghai |
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| Cite this article: |
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ZHENG Tianshui, SHEN Yuanhua, WANG Wencheng et al 1989 Chin. Phys. Lett. 6 377-380 |
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Abstract The growth of nickel polycrystals in the e-beam evaporated Ni film was studied by electron diffraction and TEM image. The in-situ resistance measurements of Ni film deposited on different substrates show the minimum thickness to form a continuous Ni superficial layer.
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| Keywords:
8115Ef
6114Fe
6855+b
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Published: 01 August 1989
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