Chin. Phys. Lett.  2018, Vol. 35 Issue (5): 058101    DOI: 10.1088/0256-307X/35/5/058101
CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Growth of $\beta$-Ga$_{2}$O$_{3}$ Films on Sapphire by Hydride Vapor Phase Epitaxy
Ze-Ning XIONG, Xiang-Qian XIU**, Yue-Wen LI, Xue-Mei HUA, Zi-Li XIE, Peng CHEN, Bin LIU, Ping HAN, Rong ZHANG**, You-Dou ZHENG
Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University, Nanjing 210093
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Ze-Ning XIONG, Xiang-Qian XIU, Yue-Wen LI et al  2018 Chin. Phys. Lett. 35 058101
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Abstract Two-inch Ga$_{2}$O$_{3}$ films with ($\bar{2}$01)-orientation are grown on $c$-sapphire at 850–1050$^{\circ}\!$C by hydride vapor phase epitaxy. High-resolution x-ray diffraction shows that pure $\beta$-Ga$_{2}$O$_{3}$ with a smooth surface has a higher crystal quality, and the Raman spectra reveal a very small residual strain in $\beta$-Ga$_{2}$O$_{3}$ grown by hydride vapor phase epitaxy compared with bulk single crystal. The optical transmittance is higher than 80% in the visible and near-UV regions, and the optical bandgap energy is calculated to be 4.9 eV.
Received: 08 January 2018      Published: 30 April 2018
PACS:  81.15.Kk (Vapor phase epitaxy; growth from vapor phase)  
  68.55.-a (Thin film structure and morphology)  
  78.20.-e (Optical properties of bulk materials and thin films)  
  78.30.-j (Infrared and Raman spectra)  
Fund: Supported by the National Key Research and Development Program of China under Grant No 2017YFB0404201, the Solid State Lighting and Energy-Saving Electronics Collaborative Innovation Center, PAPD, and the State Grid Shandong Electric Power Company.
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https://cpl.iphy.ac.cn/10.1088/0256-307X/35/5/058101       OR      https://cpl.iphy.ac.cn/Y2018/V35/I5/058101
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Ze-Ning XIONG
Xiang-Qian XIU
Yue-Wen LI
Xue-Mei HUA
Zi-Li XIE
Peng CHEN
Bin LIU
Ping HAN
Rong ZHANG
You-Dou ZHENG
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