Chin. Phys. Lett.  2014, Vol. 31 Issue (09): 095203    DOI: 10.1088/0256-307X/31/9/095203
PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
Dynamic Characteristics of a Microhollow Cathode Sustained Discharge with Split Third Electrodes for Potential Flow Application to Flow Velocimetry
Sharmin Sultana1, Jichul Shin2**
1Institute of E-vehicle Technology, University of Ulsan, Ulsan 680-749, Korea
2Department of Aerospace Engineering, University of Ulsan, Ulsan 680-749, Korea
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Sharmin Sultana, Jichul Shin 2014 Chin. Phys. Lett. 31 095203
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Abstract The dynamic behavior of a microhollow cathode sustained discharge with split third electrodes is experimentally investigated. The sustained discharge swells isotropically in the presence of a small amount of argon gas flow that is not clearly detectable with a conventional single third electrode. At high flow rates, the sustained discharge transitions to a fast-moving constricted discharge with an arc shape. The modified discharge structure causes a shift in current distribution over the third electrodes, and the current peak location varies linearly with the flow rate over a certain flow range. Such linear behavior may be applied to in situ flow velocity measurement.
Published: 22 August 2014
PACS:  52.30.-q (Plasma dynamics and flow)  
  52.80.Hc (Glow; corona)  
  52.70.Ds (Electric and magnetic measurements)  
  52.77.-j (Plasma applications)  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/31/9/095203       OR      https://cpl.iphy.ac.cn/Y2014/V31/I09/095203
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Sharmin Sultana
Jichul Shin
[1] Becker K, Koutsospyros A, Yin S M, Christodoulatos C, Abramzon N, Joaquin J C and Brelles-Marino G 2005 Plasma Phys. Control. Fusion 47 B513
[2] Shin J and Raja L L 2006 Appl. Phys. Lett. 88 021502
[3] Bauville G, Lacour B, Magne L, Puech V, Boeuf J P, Munoz-Serrano E and Pitchford L C 2007 Appl. Phys. Lett. 90 031501
[4] Bromberg L, Cohn D R, Rabinovich A and Heywood J 2001 Int. J. Hydrogen Energy 26 1115
[5] Ito T, Ito T and Yokoyama S 2011 Appl. Phys. Express 4 026201
[6] Schoenbach K H, Verhappen R, Tessnow T, Peterkin F E and Byszewski W W 1996 Appl. Phys. Lett. 68 13
[7] Stark R H and Schoenbach K H 1999 J. Appl. Phys. 85 2075
[8] Rahman M T and Shin J 2011 Appl. Phys. Express 4 096001
[9] Hsu D D and Graves D B 2003 J. Phys. D: Appl. Phys. 36 2898
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