| Original Articles |
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Raman Scattering Detection of Stacking Faults in Free-Standing Cubic-SiC Epilayer |
| LIU Xing-Fang;SUN Guo-Sheng;LI Jin-Min;ZHAO Yong-Mei;LI Jia-Ye;WANG Lei;ZHAO Wan-Shun;ZENG Yi-Ping |
| Novel Semiconductor Material Laboratory, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 |
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| Cite this article: |
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LIU Xing-Fang, SUN Guo-Sheng, LI Jin-Min et al 2006 Chin. Phys. Lett. 23 2834-3837 |
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Abstract We report on stacking fault (SF) detection in free-standing cubic-SiC epilayer by the Raman measurements. The epilayer with enhanced SFs is heteroepitaxially grown by low pressure chemical vapour deposition on a Si(100) substrate and is released in KOH solution by micromechanical manufacture, on which the Raman measurements are performed in a back scattering geometry. The TO line of the Raman spectra is considerably broadened and distorted. We discuss the influence of SFs on the intensity profiles of TO mode by comparing our experimental data with the simulated results based on the Raman bond polarizability (BP) model in the framework of linear-chain concept. Good agreement with respect to the linewidth and disorder-induced peak shift is found by assuming the mean distance of the SFs to be 11Å in the BP model.
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| Keywords:
61.72.Nn
61.72.Dd
78.30.-j
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Published: 01 October 2006
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| PACS: |
61.72.Nn
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(Stacking faults and other planar or extended defects)
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61.72.Dd
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(Experimental determination of defects by diffraction and scattering)
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78.30.-j
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(Infrared and Raman spectra)
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