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ION ENDUCED ADHESION BETWEEN METALS AND OXIDES |
| CHENG Guoan*;LI Hengde*;LIU Baixin |
| *Department of Engineering Physics, Tsinghua University, Beijing
Center of Theoretical Physics, CCAST(Wor1d Lab.)
Department of Engineering Physics, Tsinghua University, Beijing |
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| Cite this article: |
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CHENG Guoan, LI Hengde, LIU Baixin 1988 Chin. Phys. Lett. 5 197-200 |
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Abstract The enhancement of adhesion between deposited metal layers ( Ti and Cu) and the oxide substrates at RT and 300°c respectively was studied by argon ion irradiation to various doses. The experimental results showed that the adhesive strength increased after a threshold dose irradiation and reached as aturation value at higher doses in all metal/oxide pairs. RBS spectra showed that chemical reaction had taken place in Ti /oxide case, while in Cu/oxide case, both RBS and XPS analysis showed that no evidence of such reaction had been induced.
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Published: 01 May 1988
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