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Electron Field Emission from Nitrogen Ion Implantat ion Diamond-Like Carbon Film |
| MA Hui-zhong1,3;ZHANG Lan1;YAO Ning2;LI Yun-jun2;ZHANG Bing-lin2;HU Huan-ling3 |
| 1Department of Mathematics and Physics, Zhengzhou University of Technology, Zhengzhou 450002
2Department of Physics, Zhengzhou University, Zhengzhou 450052
3Anhui Optics and Fine Mechanics Institute, Chinese Academy of Sciences, Hefei 230031
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| Cite this article: |
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MA Hui-zhong, ZHANG Lan, YAO Ning et al 1999 Chin. Phys. Lett. 16 608-609 |
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Abstract The electron field emission from both diamond-like carbon(DLC) and nitrogen doped diamond-like carbon films by ion implantation was studied. The DLC films were deposited on a molybdenum layer coated on ceramic by using pulsed laser deposition. The field emission measurements show that the incorporation of nitrogen in DLC films can increase current density and lower the turn-on field from 9 to 4 V/μm, which indicate that the nitrogen doped DLC films have a potential application as field emission materials for flat panel displays.
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| Keywords:
79.70.+q
81.15.Gh
73.40.Gk
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Published: 01 August 1999
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| PACS: |
79.70.+q
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(Field emission, ionization, evaporation, and desorption)
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81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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73.40.Gk
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(Tunneling)
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