Chin. Phys. Lett.  2021, Vol. 38 Issue (12): 127201    DOI: 10.1088/0256-307X/38/12/127201
CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
Realizing n-Type GeTe through Suppressing the Formation of Cation Vacancies and Bi-Doping
Min Zhang , Chaoliang Hu , Qi Zhang , Feng Liu , Shen Han , Chenguang Fu , and Tiejun Zhu*
School of Materials Science and Engineering, and State Key Laboratory of Silicon Materials, Zhejiang University, Zhejiang 310027, China
Cite this article:   
Min Zhang, Chaoliang Hu, Qi Zhang et al  2021 Chin. Phys. Lett. 38 127201
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Abstract It is known that p-type GeTe-based materials show excellent thermoelectric performance due to the favorable electronic band structure. However, n-type doping in GeTe is of challenge owing to the native Ge vacancies and high hole concentration of about $10^{21}$ cm$^{-3}$. In the present work, the formation energy of cation vacancies of GeTe is increased through alloying PbSe, and further Bi-doping enables the change of carrier conduction from p-type to n-type. As a result, the n-type thermoelectric performance is obtained in GeTe-based materials. A peak $zT$ of 0.34 at 525 K is obtained for (Ge$_{0.6}$Pb$_{0.4})_{0.88}$Bi$_{0.12}$Te$_{0.6}$Se$_{0.4}$. These results highlight the realization of n-type doping in GeTe and pave the way for further optimization of the thermoelectric performance of n-type GeTe.
Received: 28 August 2021      Published: 18 November 2021
PACS:  81.05.Hd (Other semiconductors)  
  84.60.Rb (Thermoelectric, electrogasdynamic and other direct energy conversion)  
  72.20.Pa (Thermoelectric and thermomagnetic effects)  
  61.72.jd (Vacancies)  
Fund: Supported by the National Science Fund for Distinguished Young Scholars (Grant No. 51725102), and the National Natural Science Foundation of China (Grant No. 51861145305).
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https://cpl.iphy.ac.cn/10.1088/0256-307X/38/12/127201       OR      https://cpl.iphy.ac.cn/Y2021/V38/I12/127201
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Min Zhang
Chaoliang Hu
Qi Zhang
Feng Liu
Shen Han
Chenguang Fu
and Tiejun Zhu
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