Evolution of Residual Stress and Structure in YSZ/SiO2 Multilayers with Different Modulation Ratios
XIAO Qi-Ling** , HU Guo-Hang, HE Hong-Bo, SHAO Jian-Da
Key Laboratory of Materials for High Power Lasers, Chinese Academy of Sciences, PO Box 800-211, Shanghai 201800
Abstract ：The multilayer (ML) YSZ/SiO2 films with different modulation ratios ranging from 1: 3, 4: 9, 1: 1 to 3: 1 (the thickness ratio of the YSZ to SiO2 ) are deposited on BK7 glass substrates by electron beam evaporation under the same processing conditions. The effect of modulation ratio on the residual stresses and structure are investigated by an optical interferometer and Grazing incidence x-ray diffraction. The results show that the total residual stress in MLs is compressive and decreases to tensile when the modulation ratio is changed from 1: 3 to 3: 1. The YSZ films are of cubic phase structure and the SiO2 films are amorphous in all the MLs. The change of residual stress in these MLs can be attributed to the variation of an individual layer?s stress with thickness, which indicates that adjusting the thickness ratio of two materials is an effective measure for depositing near-zero stress MLs.
收稿日期: 2012-10-26
出版日期: 2013-03-02
[1] Sullivan B T and Dobrowolski J A 1993 Appl. Opt. 32 2351 2010 Vacuum 84 778 2011 Chin. Phys. Lett. 28 047802 1997 Acta Mater. 8 3123 2002 Surf. Coat. Technol. 155 152 Acta Phys. Sin. 52 1028 (in Chinese)1997 Proc. SPIE 296 3008 2001 Thin Solid Films 389 278 2005 Opt. Lett. 30 2119 2011 Chin. Phys. Lett. 28 048101 2006 Surf. Coat. Technol. 200 4579 2011 Surf. Coat. Technol. 206 405 2006 Appl. Surf. Sci. 253 1561 2011 Acta Mater. 59 2330 2008 Vacuum 83 266 2008 Chin. Phys. Lett. 25 3433 Acta Opt. Sin. 25 126(in Chinese)U. S. Patent No 1696328 (8 June 2005)1998 Vacuum 51 127 2001 J. Appl. Crystallogr. 34 427 2002 Thin Solid Films 418 182
[1]
.
[2]
.
[3]
XU Ming**;SHEN Wei-Dong**;ZHANG Yue-Guang;ZHEN Hong-Yu;LIU Xu
. Optical Properties of BDK-Doped Highly Photosensitive Sol-Gel Hybrid Film
[4]
LIU Na;WANG Ying-Jian;ZHOU Ming;JING Xu-Feng;WANG Yan-Zhi;CUI Yun;JIN Yun-Xia. Laser Resistance of Ta2 O5 /SiO2 and ZrO2 /SiO2 Optical Coatings under 2μm Femtosecond Pulsed Irradiation
[5]
LI Bin-Cheng;LIN Da-Wei;HAN Yan-Ling;GUO Chun;ZHANG Yun-Dong;LIU Hong-Xiang. Anti-Reflective Fluoride Coatings for Widely Tunable Deep-Ultraviolet Diode-Pumped Solid-State Laser Applications
[6]
QI Chun-Chao;ZUO Du-Luo;MENG Fan-Qi;CHENG Zu-Hai;. Theoretical Design of a Wedged Output Coupler Coated by Capacitive Strip-Grating for Optically Pumped Terahertz Lasers
[7]
WANG Yan-Zhi;SHAO Jian-Da;DONG Hong-Cheng;ZHANG Wei-Li;CUI Yun;HE Hong-Bo;FAN Zheng-Xiu. Design and Fabrication of Chirped Mirror
[8]
ZHOU Ming;ZHAO Yuan-An;LING Xiu-Lan;LI Shu-Hong;SHAO Jian-Da;FAN Zheng-Xiu. Damage Performance of Multilayer Films under Simultaneous Exposure to Multi-Wavelength Pulses
[9]
LING Xiu-Lan;ZHAO Yuan-An;LI Da-Wei;ZHOU Ming;SHAO Jian-Da;FANZheng-Xiu. Effect of Vacuum on the Laser-Induced Damage of Anti-Reflection Coatings
[10]
WANG Li;WANG Zhan-Shan;SANG Tian;WU Yong-Gang;CHEN Ling-Yan;LIU Hua-Song;JI Yi-Qin. Broadening of Non-Transmission Band of Ultra-Narrow Band-Pass Filters Using Heterostructures
[11]
ZHAN Mei-Qiong;WU Zhong-Lin;FAN Zheng-xiu. Working Pressure Dependence of Properties of Al2 O3 Thin Films Prepared by Electron Beam Evaporation
[12]
CUI Yun;LIU Shi-Jie;HE Hong-Bo;ZHAO Yuan-An;SHAO Jian-Da;FAN Zheng-Xiu. Influence of Vacuum Organic Contaminations on Laser-Induced Damage of 1064nm Anti-Reflective Coatings
[13]
YAO Jian-Ke;JIN Yun-Xia;ZHAO Yuan-An;HE Hong-Bo;SHAO Jian-Da;FAN Zheng-Xiu. Effect of Process Parameters on Laser Damage Threshold of TiO2 Coatings
[14]
YAO Jian-Ke;LI Hai-Yuan;FAN Zheng-Xiu;TANG Yong-Xing;JIN Yun-Xia;ZHAO Yuan-An;HE Hong-Bo;SHAO Jian-Da. Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process
[15]
XIA Zhi-Lin;DENG De-Gang;FAN Zheng-Xiu;SHAO Jian-Da. Development in Laser Induced Extrinsic Absorption Damage Mechanism of Dielectric Films
2013, Vol. 30 
