摘要Tapered dielectric structures in metal have exhibited extraordinary performance in both surface plasmon polariton (SPP) waveguiding and SPP focusing. This is crucial to plasmonic research and industrial plasmonic device integration. We present a method that facilitates easy fabrication of smooth-surfaced sub-micron tapered structures in large scale simply with electron beam lithography (EBL). When a PMMA layer is spin-coated on previously-EBL-defined PMMA structures, steep edges can be transformed into a declining slope to form tapered PMMA structures, scaled from 10nm to 1000nm. Despite the simplicity of our method, patterns with PMMA surface smoothness can be well-positioned and replicated in large numbers, which therefore gives scientists easy access to research on the properties of tapered structures.
Abstract：Tapered dielectric structures in metal have exhibited extraordinary performance in both surface plasmon polariton (SPP) waveguiding and SPP focusing. This is crucial to plasmonic research and industrial plasmonic device integration. We present a method that facilitates easy fabrication of smooth-surfaced sub-micron tapered structures in large scale simply with electron beam lithography (EBL). When a PMMA layer is spin-coated on previously-EBL-defined PMMA structures, steep edges can be transformed into a declining slope to form tapered PMMA structures, scaled from 10nm to 1000nm. Despite the simplicity of our method, patterns with PMMA surface smoothness can be well-positioned and replicated in large numbers, which therefore gives scientists easy access to research on the properties of tapered structures.
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2009, Vol. 26 
