Preparation of Nano-Graphite Films and Field Emission Properties
ZHAO Yong-Mei, ZHANG Bing-Lin, YAO Ning, LU Zhan-Ling, ZHANG Xin-Yue
Laboratory of Materials Physics (Ministry of Education) and Department of Physics, Zhengzhou University, Zhengzhou 450052
Preparation of Nano-Graphite Films and Field Emission Properties
ZHAO Yong-Mei;ZHANG Bing-Lin;YAO Ning;LU Zhan-Ling;ZHANG Xin-Yue
Laboratory of Materials Physics (Ministry of Education) and Department of Physics, Zhengzhou University, Zhengzhou 450052
关键词 ：
61.46.+w ,
79.70.+q ,
81.15.Gh
Abstract ： Nano-graphite films have been deposited on n-Si substrates by microwave plasma chemical vapour deposition. The surface morphology and microstructure of the films were tested by scanning electron microscopy, x-ray diffraction and Raman spectroscopy. In the field emission measurement, a turn-on field of 0.5 V/μm and a high emission-site density of 105 /cm2 on a tested emission area of (34 x 35 mm2 ) have been obtained.
Key words ：
61.46.+w
79.70.+q
81.15.Gh
出版日期: 2004-05-01
:
61.46.+w
79.70.+q
(Field emission, ionization, evaporation, and desorption)
81.15.Gh
(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
引用本文:
ZHAO Yong-Mei;ZHANG Bing-Lin;YAO Ning;LU Zhan-Ling;ZHANG Xin-Yue. Preparation of Nano-Graphite Films and Field Emission Properties[J]. 中国物理快报, 2004, 21(5): 904-906.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2004/V21/I5/904
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2004, Vol. 21 
