Analysis of Aberrations in Laser-Focused Nanofabrication
ZHANG Wen-Tao1,2, ZHANG Bao-Wu1, LI Tong-Bao1
1Department of Physics, Tongji University, Shanghai 2000922Institute of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004
Analysis of Aberrations in Laser-Focused Nanofabrication
ZHANG Wen-Tao1,2;ZHANG Bao-Wu1;LI Tong-Bao1
1Department of Physics, Tongji University, Shanghai 2000922Institute of Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004
摘要Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams--Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences.
Abstract:Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams--Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences.
[1] Drodofsky U, Drewsen M, Pfau T, Nowack S and Mlynek J 1996 Microelectron. Engin. 30 383 [2] Jurdik E, Hohlfeld J, Kempen H and Rasing T 2002 Appl.Phys. Lett. 23 4443 [3] Timp G, Behringer R E, Tennant D M and Cunningham J E 1992 Phys. Rev. Lett. 69 1636 [4] McClelland J J, Behringer R E and Tennant D M 1993 Science 262 877 [5] Gupta R, McClelland J J and Marte P 1995 Appl. Phys.Lett. 67 1378 [6] Schulze T, Brezger B, Schmidt P O, Mertens R, Bell A S, Pfau T andMlynek J 1999 Microelectron. Engin. 46 105 [7] Ohmukai R, Urabe S and Watanabe M 2003 Appl. Phys. B 77 415 [8] Sligte E, Smeets B, Stam K M R, Herfst R W, Straten P, BeijerinckH C W and Leeuwen K A H 2004 Appl. Phys. Lett. 85 4493 [9] Fioretti A, Camposeo A, Tantussi F, Arimondo E, Gozzini S andGabbanini C 2005 Appl. Surf. Sci. 248 196 [10] Berggren K.K, Prentiss M, Timp G L and Behringer R E 1994 J. Opt. Soc. Am. B 11 1166 [11] Chen X Z, Yao H M and Chen X N 2004 Chin. Opt. Lett. 2 187 [12] Arun R, Averbukh I S and Pfau T 2005 Phys. Rev. A 72 023417 [13] Riis E 1995 Phys. Rev. A 52 920 [14] Rostami A and Rahmani A 2006 Microelectron. J. 37 57 [15] Zhang W T and Li T B 2006 Chin. Phys. Lett. 23 2952 [16] McClelland J J, Hill S B, Pichler M and Robert J C 2004 Sci.Technol. Adv. Mater. 5 575 [17] Mutzel M, Rasbach U, Meschede D, Burstedde C, Braun J, Kunoth A,Peithmann K and Buse K 2003 Appl. Phys. B 77 1 [18] McClelland J J 1995 J. Opt. Soc. Am. B 12 1761 [19] McGowan R W and Giltner D M 1995 Opt. Lett. 20 2535 [20] Anderson W R, Bradley C C, McClland J J and Celotta R J 1999 Phys. Rev. A 59 2476 [21] McClelland J J 1995 J. Opt. Soc. Am. B 12 1761