Erratum: Magnetic Proximity Effect in an Antiferromagnetic Insulator/Topological Insulator Heterostructure with Sharp Interface [<a class=

doi:10.1088/0256-307X/38/10/109901

Chin. Phys. Lett.

2021, Vol. 38

Issue (10): 109901 DOI: 10.1088/0256-307X/38/10/109901

COMMENTS AND ERRATA

Erratum: Magnetic Proximity Effect in an Antiferromagnetic Insulator/Topological Insulator Heterostructure with Sharp Interface [Chin. Phys. Lett. 38 (2021) 057303]

Yuxin Liu^1,2, Xuefan Niu^1,2, Rencong Zhang^1,2, Qinghua Zhang^1,2, Jing Teng^1,2*, and Yongqing Li^1,2*

¹Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
²School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100049, China

Cite this article:

Yuxin Liu, Xuefan Niu, Rencong Zhang et al 2021 Chin. Phys. Lett. 38 109901

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Received: 25 June 2021 Published: 10 September 2021

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https://cpl.iphy.ac.cn/10.1088/0256-307X/38/10/109901 OR https://cpl.iphy.ac.cn/Y2021/V38/I10/109901

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