| CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
|
|
|
|
Structure and Magnetic Properties of the γ'-Fe4N Films on Cu Underlayers |
| JIANG Feng-Xian, ZHAO Ye, ZHOU Guo-Wei, ZHANG Jun, FAN Jiu-Ping, XU Xiao-Hong** |
Key Laboratory of Magnetic Molecules and Magnetic Information Material (Ministry of Education), School of Chemistry and Materials Science, Shanxi Normal University, Linfen 041004
|
|
| Cite this article: |
|
JIANG Feng-Xian, ZHAO Ye, ZHOU Guo-Wei et al 2015 Chin. Phys. Lett. 32 087501 |
|
|
|
|
Abstract The γ'-Fe4N films on Cu underlayers are deposited on the glass and Si substrates by dc magnetron reactive sputtering. The effects of Cu underlayer on the structure, morphology and magnetic properties of the γ'-Fe4N films are studied. The single-phase γ'-Fe4N films with Cu underlayers on the glass substrate are obtained, while the mixture of Fe and γ'-Fe4N is observed on the Si substrate. In comparison with the films without Cu underlayers, the grains of the films with Cu underlayers exhibit a non-uniform size distribution and give rise to a rougher surface. The magnetic measurements indicate that the γ'-Fe4N films show a good soft ferromagnetic behavior. The enhanced coercivity in the films with Cu underlayers is observed due to the deterioration of the crystallographic structure as well as the rougher surface.
|
|
|
Received: 13 April 2015
Published: 02 September 2015
|
|
| PACS: |
75.50.Bb
|
(Fe and its alloys)
|
| |
75.70.Ak
|
(Magnetic properties of monolayers and thin films)
|
| |
61.05.cp
|
(X-ray diffraction)
|
|
|
|
|
|
[1] Coey J M D and Smith P A I 1999 J. Magn. Magn. Mater. 200 405
[2] Mi W B, Feng X P, Duan X F, Yang H, Li Y and Bai H L 2012 Thin Solid Films 520 7035
[3] Takahashi N, Toda Y, Nakamura T and Fujii T 1999 Jpn. J. Appl. Phys. 38 6031
[4] Ito K, Lee G H, Harada K, Suzuno M, Suemasu T, Takeda Y, Saitoh Y, Ye M, Kimura A and Akinaga H 2011 Appl. Phys. Lett. 98 102507
[5] Ji N, Liu X and Wang J P 2010 New J. Phys. 12 063032
[6] Ji N, Osofsky M S, Lauter V, Allard L F, Li X, Jensen K L, Ambaye H, Lara-Curzio E and Wang J P 2011 Phys. Rev. B 84 245310
[7] Yang M, Allard L F, Ji N, Zhang X, Yu G H and Wang J P 2013 Appl. Phys. Lett. 103 242412
[8] Atiq S, Ko H S, Siddiqi S A and Shin S C 2008 Appl. Phys. Lett. 92 222507
[9] Feng X P, Mi W B and Bai H L 2011 Appl. Surf. Sci. 257 7320
[10] Ito K, Lee G H, Akinaga H and Suemasu T 2011 J. Cryst. Growth 322 63
[11] Kokado S, Fujima N, Harigaya K, Shimizu H and Sakuma A 2006 Phys. Rev. B 73 172410
[12] Narahara A, Ito K, Suemasu T, Takahashi Y K, Ranajikanth A and Hono K 2009 Appl. Phys. Lett. 94 202502
[13] Sunaga K, Tsunoda M, Komagaki K, Uehara Y and Takahashi M 2007 J. Appl. Phys. 102 013917
[14] Komasaki Y, Tsunoda M, Isogami S and Takahashi M 2009 J. Appl. Phys. 105 07C928
[15] Gallego J M, Grachev S Y, Borsa D M, Boerma D O, écija D and Miranda R 2004 Phys. Rev. B 70 115417
[16] Feng X P, Mi W B and Bai H L 2011 J. Appl. Phys. 110 053911
[17] Zhang L, Ma T, Ahmad Z, Yuan T, Lu C, Xu Y and Yan M 2011 J. Alloys Compd. 509 5075
[18] Loloee R, Nikolaev K R and Pratt W P 2003 Appl. Phys. Lett. 82 3281
[19] Li J, Jiang Y, Ma T, Lu C, Xu Y, Yang D and Yan M 2012 Physica B 407 4783
[20] Wang L L, Wang X, Ma N, Zheng W T, Jin D H and Zhao Y Y 2006 Surf. Coat. Technol. 201 786
[21] Babu V H, Rajeswari J, Venkatesh S and Markandeyulu G 2013 J. Magn. Magn. Mater. 339 1 |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
