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Nano-Traceability Study of a Cr Standard Grating Fabricated by Laser-Focused Atomic Deposition |
| LEI Li-Hua1,2, LI Yuan2, FAN Guo-Fang3, WENG Jun-Jing1,2, DENG Xiao1, CAI Xiao-Yu2, LI Tong-Bao1** |
1School of Physics Science and Engineering, Tongji University, Shanghai 200092
2Shanghai Institute of Measurement and Testing Technology, National Center of Measurement and Testing for East China, National Center of Testing Technology, Shanghai 201203
3Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190
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| Cite this article: |
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LEI Li-Hua, LI Yuan, FAN Guo-Fang et al 2014 Chin. Phys. Lett. 31 070601 |
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Abstract A dimensional artifact is developed, which is a chromium (Cr) deposition grating fabricated by a laser-focused atomic deposition technique. The mean pitch of the grating is measured by using a metrological atomic force microscope with a large range, where a series of reference signs have been performed to locate the deposition area. Cosine error of the measurement result is analyzed and eliminated by the iterative angle calibration. The measurement result shows that the mean pitch of the grating is 212.66 ± 0.02 nm, which is very close to half of the standing laser wavelength (λ=425.55 nm). This means that the grating has traceability with high accuracy and can substitute the laser interference technology for instrument calibration. Moreover, using the Cr deposition grating as a nano standard can shorten the traceability chain and improve the practical application.
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Published: 30 June 2014
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