CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Optical Performance of N-Face AlGaN Ultraviolet Light Emitting Diodes |
YU Hong-Ping, LI Shi-Bin**, ZHANG Peng, WU Shuang-Hong, WEI Xiong-Bang, WU Zhi-Ming, CHEN Zhi |
State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054
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Cite this article: |
YU Hong-Ping, LI Shi-Bin, ZHANG Peng et al 2014 Chin. Phys. Lett. 31 108502 |
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Abstract The optical property and injection efficiency of N-face AlGaN based ultraviolet light emitting diodes (UV-LEDs) are studied and compared with Ga-face AlGaN based UV-LEDs. A staircase electron injector is introduced in the N-face AlGaN based UV-LED. The electroluminescence spectra, power-current performance curves, energy band diagrams, carrier concentration and radiative recombination rate are numerically calculated. The results indicate that the N-face UV-LED has a better optical performance than the Ga-face UV-LED, and the injection efficiency is enhanced owing to the fact that the staircase electron injector is available for UV-LEDs.
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Published: 31 October 2014
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PACS: |
85.60.Jb
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(Light-emitting devices)
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73.50.-h
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(Electronic transport phenomena in thin films)
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87.15.A-
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(Theory, modeling, and computer simulation)
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73.61.Ey
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(III-V semiconductors)
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[1] Shur M S and Gaska R 2010 IEEE Trans. Electron Devices 57 12 [2] Lu H M, Yu T J, Yuan G C, Chen X J, Chen Z Z, Chen G X and Zhang G Y 2012 Opt. Lett. 37 3693 [3] Shen Y C, Mueller G O, Watanabe S, Gardner N F, Munkholm A and Krames M R 2007 Appl. Phys. Lett. 91 141101 [4] Kim M, Schubert M F, Dai Q, Kim J K, Schubert E F, Piprek J and Park Y 2007 Appl. Phys. Lett. 91 183507 [5] Schubert M F, Xu J, Kim J K, Schubert E F, Kim M H, Yoon S, Lee S M, Sone C, Sakong T and Park Y 2008 Appl. Phys. Lett. 93 041102 [6] Ma J, Dong K, Chen D, Lu H, Chen P, Zhang R and Zheng Y 2013 Chin. Phys. Lett. 30 068501 [7] Li S, Ware M, Wu J, Minor P and Wang Z M 2012 Appl. Phys. Lett. 101 122103 [8] Li S, Zhang T, Wu J, Yang Y J, Wang Z M, Wu Z M, Chen Z and Jiang Y D 2013 Appl. Phys. Lett. 102 062108 [9] Ni X, Li X, Lee J, Liu S, Avrutin V, ?zgür ü Morko? H, Matulionis A, Paskova T, Mulholland G and Evans K R 2010 Appl. Phys. Lett. 97 031110 [10] Ni X, Li X, Lee J, Liu S, Avrutin V, ?zgür ü Morko? H and Matulionis A 2010 J. Appl. Phys. 108 033112 [11] Piprek J 2011 IEEE Int. Conf. Numer. Simulation Optoelectronic Devices (Rome, Italy 5–8 September 2011) p 191 [12] Verma J, Simon J, Protasenko V, Xing G and Jena D 2010 IEEE International Conference on Device Research Conference (IN, America 21–23 June 2010) p 227 [13] Verma J, Simon J, Protasenko V, Kosel T, Xing H G and Jena D 2011 Appl. Phys. Lett. 99 171104 [14] Li X, Okur S, Zhang F, Avrutin V, ?zgür ü Morkoc H, Hong S M, Yen S H, Hsu T C and Matulionis A 2012 J. Appl. Phys. 111 063112 [15] Zhang F, Li X, Hafiz S, Okur S, Avrutin V, ?zgür ü Morkoc H and Matulionis A 2013 Appl. Phys. Lett. 103 051122 [16] Cai J X, Sun H Q, Zheng H, Zhang P J and Guo Z Y 2014 Chin. Phys. B 23 058502 [17] Akasaki I, Amano H, Koide Y, Hiramatsu K and Sawaki N 1989 J. Cryst. Growth 98 209 [18] Chichibu S, Wada K and Nakamura S 1997 Appl. Phys. Lett. 71 2346 [19] Levinshtein M E, Rumyantsev S L and Shur M S 2001 Properties of Advanced Semiconductor Materials: GaN, AIN, InN, BN, SiC, SiGe (New York: John Wiley & Sons) chap 1 p 8 [20] Fiorentini V, Bernardini F, Sala F D, Carlo A D and Lugli P 1999 Phys. Rev. B 60 8849 [21] Vurgaftman I, Meyer J R and Ram-Mohan L R 2001 J. Appl. Phys. 89 5815 |
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