CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
|
|
|
|
An Improvement of the Thermal Stability of SnTe through Nitrogen Doping |
XIA Meng-Jiao1,2, RAO Feng1**, SONG Zhi-Tang1, REN Kun1,2, WU Liang-Cai1, LIU Bo1, FENG Song-Lin1 |
1State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences, Shanghai 200050 2University of Chinese Academy of Sciences, Beijing 100049
|
|
Cite this article: |
XIA Meng-Jiao, RAO Feng, SONG Zhi-Tang et al 2013 Chin. Phys. Lett. 30 037401 |
|
|
Abstract Nitrogen doping is applied to improve the thermal stability of SnTe. The crystallization temperature Tc of SnTe is below room temperature, which can be elevated to 216°C by 7.65at.% nitrogen doping. Nitrogen doping results in the formation of SnNx in the nitrogen doped SnTe (N-SnTe) materials, which hinders the movement of atoms and suppresses the crystallization, leading to a better thermal stability. The crystallization activation energy (Ea) and data retention for ten years of 7.65at.% N-SnTe are 1.89 eV and 81°C, respectively. Moreover, the voltage pulses have successfully triggered the SET and RESET operations of the N-SnTe based device at the voltage of 0.9 V and 2.6 V. The good thermal stability and reversible phase-change ability have proved the potential of N-SnTe for phase-change memory application.
|
|
Received: 12 November 2012
Published: 29 March 2013
|
|
PACS: |
74.62.-c
|
(Transition temperature variations, phase diagrams)
|
|
81.05.-t
|
(Specific materials: fabrication, treatment, testing, and analysis)
|
|
85.05.Zx
|
|
|
81.07.-b
|
(Nanoscale materials and structures: fabrication and characterization)
|
|
|
|
|
[1] Burr G, Breitwisch M, Franceschini M, Garetto D, Gopalakrishnan K, Jackson B, Kurdi B, Lam C, Lastras L, Padilla A, Rajendran B, Raous S and Shenoy R 2010 J. Vac. Sci. Technol. B 28 223 [2] Lencer D, Salinga M, Grabowski B, Hickel T, Neugebauer J and Wuttig M 2008 Nat. Mater. 7 972 [3] Ren K, Rao F, Song Z, Wu L, Peng C, Zhou X, Xia M, Liu B, Feng S and Chen B 2010 Jpn. J. Appl. Phys. 49 080212 [4] Cheng H Y, Hsu T H, Raoux S, Wu J Y, Du P, Breitwisch M, Zhu Y, Lai E, Joseph E, Mittal S, Cheek R, Schrott A, Lai S, Lung H and Lam C 2011 IEDM Tech. Dig. 3.4.1 [5] Yin Y, Sone H and Sumio H 2007 J. Appl. Phys. 102 064503 [6] Inoue Y, Nomoya M and Takai O 1998 Vacuum 51 673 [7] Lutzenlirchen-Hecht D and Frahm D 2005 Thin Solid Films 493 67 [8] Bertoti I 2002 Surf. Coat. Technol. 151 194 [9] Li X, Rao F, Song Z, Zhu M, Liu L and Sun Z 2011 J. Appl. Phys. 110 094318 [10] Kao K, Lee C, Chen M, Tsai M and Chin T 2009 Adv. Mater. 21 1695 [11] Rao F, Song Z, Ren K, Zhou X, Cheng Y, Wu L and Liu B 2011 Nanotechnology 22 145702 |
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|