Chin. Phys. Lett.  2012, Vol. 29 Issue (9): 098101    DOI: 10.1088/0256-307X/29/9/098101
CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
A New Grating Fabrication Technique on Metal Films Using UV-Nanoimprint Lithography
TANG Min-Jin1, XIE Hui-Min1**, LI Yan-Jie1, LI Xiao-Jun2, WU Dan1
1AML, Department of Engineering Mechanics, Tsinghua University, Beijing 100084
2National Center for Nanoscience and Technology, Beijing 100084
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TANG Min-Jin, XIE Hui-Min, LI Yan-Jie et al  2012 Chin. Phys. Lett. 29 098101
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Abstract Although grating fabrication technologies on solid materials are well developed, grating fabrication on free standing films is rather more difficult. We propose a new film grating fabrication method based on UV-nanoimprint lithography. This method combines the grating fabrication technique using nanoimprint lithography with thin film preparation technology. It involves the fabrication of a PMMA grating by UV-nanoimprint lithography, followed by the preparation of a thin metal film on the PMMA grating and the patterning of the tensile film specimen through photolithography. After dissolving the PMMA layer, the tensile film specimen becomes a free standing structure. To identify the quality of the thin film specimen as well as the grating, the specimen is loaded with uniaxial tensile stress. The Moiré method is adopted to measure the full-field deformation and the mechanical parameters of the film specimen. The successful results verify the potential of this method in grating fabrication on other film-like specimens.
Received: 14 June 2012      Published: 01 October 2012
PACS:  81.16.Nd (Micro- and nanolithography)  
  42.30.Ms (Speckle and moiré patterns)  
  68.60.Bs (Mechanical and acoustical properties)  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/29/9/098101       OR      https://cpl.iphy.ac.cn/Y2012/V29/I9/098101
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Articles by authors
TANG Min-Jin
XIE Hui-Min
LI Yan-Jie
LI Xiao-Jun
WU Dan
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