| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
|
|
|
|
Dust Particle Density and Charges in Radio-Frequency Mixture Discharge Plasma |
| WU Jing1,2**, ZHANG Peng-Yun3, SUN Ji-Zhong3, YAO Lie-Ming1, DUAN Xu-Ru2
|
1School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054
2Center for Fusion Science, Southwestern Institute of Physics, Chengdu 610054
3School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024
|
|
| Cite this article: |
|
WU Jing, ZHANG Peng-Yun, SUN Ji-Zhong et al 2011 Chin. Phys. Lett. 28 095201 |
|
|
|
|
Abstract We develop a method for measuring the density and charges of dust particles in a capacitive coupled cylinder discharge chamber in mixtures of gases SiH4/C2H4/Ar. Dust particles are created in situ using these reactive mixtures in rf discharge. A Langmuir probe is employed for the measurement of important plasma parameters, such as electron density, electron temperature and ion density. The density and charges of dust particles is then calculated based on the data of the measurement of these parameters and a known dust plasma sheath model. The curves of dust particle density versus rf power and gas pressure are presented, respectively, under various experimental conditions. The dust charges versus different experimental conditions are also evaluated and presented.
|
| Keywords:
52.27.Lw
52.25.-b
52.70.-m
|
|
|
Received: 06 May 2011
Published: 30 August 2011
|
|
| PACS: |
52.27.Lw
|
(Dusty or complex plasmas; plasma crystals)
|
| |
52.25.-b
|
(Plasma properties)
|
| |
52.70.-m
|
(Plasma diagnostic techniques and instrumentation)
|
|
|
|
|
|
[1] Courteille C et al 1996 J. Appl. Phys. 80 2069
[2] Selwyn G S et al 1989 J. Vac. Sci. Technol. A 7 2758
[3] Ho P et al 1989 J. Mater. Res. 4 873
[4] Roth R M et al 1985 Appl. Phys. Lett. 46 253
[5] Jellum G M and Graves D B 1990 Appl. Phys. Lett. 57 2077
[6] Boeuf J P et al 1994 Plasma Sources Sci. Technol. 3 407
[7] Shen Z and Kortshagen U 2002 J. Vac. Sci. Technol. A 20 153
[8] Boufendi L, Plain A, Blondeau J P, Bouchoule A, Laure C and Toogood M 1992 Appl. Phys. Lett. 60 169
[9] Stoffels W W, Stoffels E, Kroesen G M W and Hoog F J 1995 J. Appl. Phys. 78 4867
[10] Boyd R L F and Thompson J B 1959 Proc. R. Soc. London A 252 102
[11] Kawamura E, Lieberman M A, Lichtenberg A J and Hudson E A 2005 J. Vacuum Sci. Technol. A: Vacuum Surf. Films 25 1456
[12] Hopkins M B and Graham W G 1986 Rev. Sci. Instrum. 57 2210
[13] Matsoukas T and Russell M 1995 J. Appl. Phys. 77 4285
[14] Wu J, Zhang P Y, Sun J Z, Zhang J, Ding Z F and Wang D Z 2008 Chin. Phys. 17 1848
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|
