| FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Laser Cleaning Techniques for Removing Surface Particulate Contaminants on Sol-Gel SiO2 Films |
| ZHANG Chun-Lai1, LI Xi-Bin2, WANG Zhi-Guo1**, LIU Chun-Ming1,2, XIANG Xia1,2, LV Hai-Bing2, YUAN Xiao-Dong2, ZU Xiao-Tao1
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1School of Physical Electronics, University of Electronic Science and Technology of China, Chengdu 610054
2Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900
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| Cite this article: |
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ZHANG Chun-Lai, LI Xi-Bin, WANG Zhi-Guo et al 2011 Chin. Phys. Lett. 28 074205 |
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Abstract Dry laser cleaning (DLC) and laser shockwave cleaning (LSC) are used to remove the particulate contamination from SiO2 sol−gel optical films. The results show that the LSC with a shockwave initiated by plasma formation under a focused laser beam pulse offers much better efficiency than DLC. Silica particles up to 10 µm on SiO2 films can be removed without substrate damage at a gap distance of 0.5 mm, and a more uniform surface microstructure can be obtained after LSC. Furthermore, it is demonstrated that the transmittance of contaminated SiO2 films can be restored to the as-deposited value after the LSC on dispersed-particle zones. LSC has potential applications in engineering-oriented large components.
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| Keywords:
42.70.Ce
52.50.Jm
79.20.Ds
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Received: 22 March 2011
Published: 29 June 2011
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