CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
|
|
|
|
AlGaN/GaN Ultraviolet Detector with Dual Band Response |
GAO Bo**, LIU Hong-Xia, WANG Shu-Long
|
School of Microelectronics, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xidian University, Xi'an 710071
|
|
Cite this article: |
GAO Bo, LIU Hong-Xia, WANG Shu-Long 2011 Chin. Phys. Lett. 28 057802 |
|
|
Abstract The AlGaN/GaN ultraviolet detector with dual band response is investigated by a self-consistent solution of the Poisson–Schrödinger equation. Because of the polarization effect, the AlGaN/GaN UV detector with dual band response can be realized by varying the external voltage. At a low external voltage, the detector is mainly sensitive to the short wavelength. When the increasing external voltage is larger than the critical voltage, the detector has an obvious dual band response characteristic and the critical voltage is calculated. This characteristic makes nitride-based UV detector a larger potential application to develop multi band response by adjusting the Aluminum mole fraction in the AlGaN layer or even by using the AlGaN/GaN/InGaN heterostructure.
|
Keywords:
78.66.Fd
85.60.Bt
85.60.Gz
|
|
Received: 15 November 2010
Published: 26 April 2011
|
|
PACS: |
78.66.Fd
|
(III-V semiconductors)
|
|
85.60.Bt
|
(Optoelectronic device characterization, design, and modeling)
|
|
85.60.Gz
|
(Photodetectors (including infrared and CCD detectors))
|
|
|
|
|
[1] Mosca M, Reverchon J L, Grandjean N and Duboz J Y 2004 IEEE J. Sel. Top. Quantum Electron. 10 752
[2] Shen S C, Zhang Y, Yoo D, Limb J B, Ryou J H, Yoder P D and Dupuis R D 2007 IEEE Photon. Technol. Lett. 19 1744
[3] Parish G, Keller S, Kozodoy P, Ibbestson J P, Marchand H, Fini P T, Fleischer S B, Denbarrs S P, Mishra U K and Tarsa E J 1999 Appl. Phys. Lett. 75 247
[4] Lin J C, Chang Y K, Lan W H, Huang K C, Chen W R, Lan C H, Huang C C, Lin W J, Cheng Y C and Chang C M 2008 IET. Optoelectron. 2 59
[5] Lei S Y, Shen B, Cao L, Xu J, Yang Z J, Xu K and Zhang G Y 2006 J. Appl. Phys. 99 074501
[6] Huang Y, Chen D J, Lu H, Shi H B, Han P, Zhang R and Zheng Y D 2010 Appl. Phys. Lett. 96 243503
[7] Zhou J J, Jiang R L, Ji X L, Xie Z L, Han P, Zhang R and Zheng Y D 2007 Chin. J. Semiconduct. 28 947 (in Chinese)
[8] Korona K P, Drabinska A, Caban P and Struplinski W 2009 J. Appl. Phys. 105 083712
[9] Asgari A, Ahmadi E and Kalafi M 2009 Microelectron. J. 40 104
[10] Heikman S, Keller S, Wu Y, Speck J S, Denbaars S P and Mishra U K 2003 J. Appl. Phys. 93 10114
[11] Collazo R, Mita S, Daiman R and Sitar Z 2007 Phys. Status Solidi C 4 2597
[12] Peng C X, Weng H M, Zhu C F, Ye B J, Zhou X Y, Han R D, Fong W K and Surya C 2007 Physica B 391 6
[13] Ambacher O, Eickhoff M, Link A, Hermann M, Stutzmann M, Bernardini F, Fiorentini V, Smorchkova Y, Speck J, Mishra U, Schaff W, Tilak V and Eastman L F 2003 Phys. Status Solidi C 0 1878
[14] Morkoc H, Cingolani R and Gil B 1999 Mater. Res. Innovat. 3 97
[15] Buchheim C, Goldhahn R, Gobsch G, Tonisch K, Cimalla V, Nieberschotz F and Ambacher O 2008 Appl. Phys. Lett. 92 013510
[16] Malinauskas T, Aleksiejunas R, Jarasiunas K, Beaumont B, Gibart P, Georgieva A K, Janzen E, Gogova D, Monemar B and Heuken M 2007 J. Crystal. Growth 300 223
[17] Wang H C, Tang T Y, Yang C C, Malinauskas T and Jarasiunas K 2010 Thin Solid Films 519 863
[18] Farahmand M, Garetto C, Bellotti E, Brennan K F, Goana M, Ghillino E, Ghione G, Albrecht J D and Ruden P P 2001 IEEE Trans. Electron. Devices 48 535
[19] Djurisic A B and Li E H 1999 J. Appl. Phys. 85 2848
|
|
Viewed |
|
|
|
Full text
|
|
|
|
|
Abstract
|
|
|
|
|