Chin. Phys. Lett.  2010, Vol. 27 Issue (9): 098102    DOI: 10.1088/0256-307X/27/9/098102
CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
Preparation and Characteristics of Nanoscale Diamond-Like Carbon Films for Resistive Memory Applications

FU Di1,2, XIE Dan1,2, ZHANG Chen-Hui3, ZHANG Di1,2, NIU Jie-Bin4, QIAN He1,2, LIU Li-Tian1,2

1Institute of Microelectronics, Tsinghua University, Beijing 100084 2Tsinghua National Laboratory for Information Science and Technology, Beijing 100084 3State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 4Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029
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FU Di, XIE Dan, ZHANG Chen-Hui et al  2010 Chin. Phys. Lett. 27 098102
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Abstract

We propose diamond-like carbon (DLC) as the resistance change material for nonvolatile memory applications. Nanoscale DLC films are prepared by filtered cathodic vacuum arc technique and integrated to W/DLC/W structure devices. The deposited DLC film has a thickness of about 20 nm and high sp3 fraction content. Reversible bistable resistive switching from a high resistance state to a low resistance state, and vice versa, is observed under appropriate unipolar stimulation pulses. High resistance switching ratio (larger than a thousand times) and low level of switching power (about 11 μW) are demonstrated. We propose that the mechanism of the repetitive resistive switching is the growth and breakage of conductive sp2-like filaments in the predominantly sp3-type insulating carbon upon applications of voltage pulses, which is consistent with the experimental results.

Keywords: 81.05.Uw      84.37.+q      71.30.+h     
Received: 28 April 2010      Published: 25 August 2010
PACS:  81.05.Uw  
  84.37.+q (Measurements in electric variables (including voltage, current, resistance, capacitance, inductance, impedance, and admittance, etc.))  
  71.30.+h (Metal-insulator transitions and other electronic transitions)  
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https://cpl.iphy.ac.cn/10.1088/0256-307X/27/9/098102       OR      https://cpl.iphy.ac.cn/Y2010/V27/I9/098102
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FU Di
XIE Dan
ZHANG Chen-Hui
ZHANG Di
NIU Jie-Bin
QIAN He
LIU Li-Tian
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