| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Attachment Instabilities of SF6 Inductively Coupled Plasmas under Different Coupling Intensities |
| GAO Wei, SUN Bin, DING Zhen-Feng |
| Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116023 |
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| Cite this article: |
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GAO Wei, SUN Bin, DING Zhen-Feng 2009 Chin. Phys. Lett. 26 065202 |
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Abstract Characteristics of attachment instabilities in SF6 inductively coupled plasmas are experimentally studied under different coupling intensities. Experimental results show that the instabilities only occur in H modes operating in positive feedback regions. Both the sudden mode transitions and the instabilities are influenced by the coupling intensities. With increasing absorbed power, weak and middle coupling discharges can sequently undergo sudden mode transitions and attachment instabilities. In strong coupling discharges, the sudden mode transitions disappear and only attachment instabilities exist. The strong and weak coupling discharges are the most stable and unstable, respectively.
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| Keywords:
52.50.Dg
52.40.Db
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Received: 10 February 2009
Published: 01 June 2009
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| PACS: |
52.50.Dg
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(Plasma sources)
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52.40.Db
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(Electromagnetic (nonlaser) radiation interactions with plasma)
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