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Determination of Thickness and Optical Constants of ZnO Thin Films Prepared by Filtered Cathode Vacuum Arc Deposition |
WANG Ming-Dong1;ZHU Dao-Yun2;LIU Yi3;ZHANG Lin1;ZHENG Chang-Xi1;HE Zhen-Hui1;CHEN Di-Hu1;WEN Li-Shi1 |
| 1State Key Laboratory of Optoelectronic Materials and Technologies, and Department of Physics, School of Physics and Engineering, Sun Yat-Sen University, Guangzhou 5102752Experiment Center, Guangdong University of Technology, Guangzhou 5100903School of Physical Science, Shenzhen University, Shenzhen 518060 |
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| Cite this article: |
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WANG Ming-Dong, ZHU Dao-Yun, LIU Yi et al 2008 Chin. Phys. Lett. 25 743-746 |
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Abstract ZnO thin films are prepared on glass substrates by filtered cathode vacuum arc (FCVA) deposition technique. A new method is demonstrated to extract the refractive index, thickness and optical band gap of ZnO thin films from the
transmission spectrum alone. The refractive index is calculated from the extremes of the interference fingers. The transmission spectrum is divided into two terms, non-interference term and interference effect term. The thickness of thin films is calculated by simulating the interference term, and the non-interference term is used to calculate optical band gap with the gained thickness. The results are compared with measurements by using an ellipsometry and a scanning electron microscope.
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81.15.Jj
78.66.Hf
68.55.Jk
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Received: 04 April 2007
Published: 30 January 2008
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