Chin. Phys. Lett.  2005, Vol. 22 Issue (3): 697-700    DOI:
Original Articles |
Structural and Electrical Characteristics of Pb(Zr0.53,Ti0.47)O3 Thin Films Deposited on Si (100) Substrates
CHEN Bin;YANG Hao;MIAO Jun;ZHAO Li;XU Bo;DONG Xiao-Li;CAO Li-Xin;QIU Xiang-Gang;ZHAO Bai-Ru
National Laboratory for Superconductivity, Institute of Physics, Chinese Academy of Sciences, P O Box 603, Beijing 100080
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CHEN Bin, YANG Hao, MIAO Jun et al  2005 Chin. Phys. Lett. 22 697-700
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Abstract Pb(Zr0.53,Ti0.47)O3 (PZT) films were directly deposited on Si substrates without a buffer layer by pulsed laser deposition. Only (110)-oriented PZT peaks (other than Si substrate peaks) were observed from the XRD data. The electrical properties of the PZT/Si capacitor were characterized in terms of both the capacitance versus voltage (C--V) and current versus voltage (I--V) measurements. The clockwise trace of the C--V curve shows ferroelectric polarization switching, as is expected. From the I--V curves, the Schottky emission and space-charge-limited-current behaviour are found to be the mainly leakage current mechanism in a certain electric field range in the negative and positive bias, respectively.
Keywords: 77.84.-s      84.37.+q      72.20.-i     
Published: 01 March 2005
PACS:  77.84.-s (Dielectric, piezoelectric, ferroelectric, and antiferroelectric materials)  
  84.37.+q (Measurements in electric variables (including voltage, current, resistance, capacitance, inductance, impedance, and admittance, etc.))  
  72.20.-i (Conductivity phenomena in semiconductors and insulators)  
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CHEN Bin
YANG Hao
MIAO Jun
ZHAO Li
XU Bo
DONG Xiao-Li
CAO Li-Xin
QIU Xiang-Gang
ZHAO Bai-Ru
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