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Stability of Mo/Si Multilayer Structure Used in Bragg-Fresnel Optics |
| LE Zi-chun;CAO Jian-lin;LIANG Jing-qiu;PEI Shu;YAO Jin-song;CUI Cheng-jia;LI Xing-lin1 |
| Changchun Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Changchun 130022
Present address: Institute of Atomic and Molecular Physics, Jilin University, Changchun 130023
1Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022
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| Cite this article: |
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LE Zi-chun, CAO Jian-lin, LIANG Jing-qiu et al 1998 Chin. Phys. Lett. 15 522-524 |
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Abstract The thermal and chemical stabilities of Mo/Si multilayer structure used in Bragg-Fresnel optics were studied to get optimal technological parameters of pattern generation. Mo/Si multilayers were annealed at temperature ranging from 360 to 770 K, treated with acetone and 5‰ NaOH solution, and characterized by small-angle x-ray diffraction technique as well as x-ray photoelectron spectroscopy and Olympus microscopy.
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68.55.Jk. 68.60.Dv
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Published: 01 July 1998
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