Fabricating Master with Reactive Ion Beam Etching Method

Chin. Phys. Lett.

1998, Vol. 15

Issue (7): 495-497 DOI:

Original Articles

Fabricating Master with Reactive Ion Beam Etching Method

ZOU Zhi-qiang;FANG Hong-li;FU Xin-ding;CHEN Guo-ming

Shanghai Institute of Metallurgy, Chinese Academy of Sciences, Shanghai 200050

Cite this article:

ZOU Zhi-qiang, FANG Hong-li, FU Xin-ding et al 1998 Chin. Phys. Lett. 15 495-497

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Abstract The fabrication process of glass master or glass etching optical disk using reactive ion beam (RIB) etching method was studied. Photoresist was applied for image reversal. RIB etching using CF₄ gas transferred the pregrooves into the glass substrate. The shape and depth of the pregrooves in the glass is a function of the RIB etcher settings. A glass substrate of Ф130mm with etched pregrooves (track pitch was 1.6 μm and groove depth 0.1 μm ) was obtained, showing that a glass master or glass etching disc can be fabricated by this technique.

Keywords: 41.79.Yd 61.80.Jh

Published: 01 July 1998

PACS:	41.79.Yd
	61.80.Jh	(Ion radiation effects)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1998/V15/I7/0495

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	ZOU Zhi-qiang
	FANG Hong-li
	FU Xin-ding
	CHEN Guo-ming

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