| FUNDAMENTAL AREAS OF PHENOMENOLOGY(INCLUDING APPLICATIONS) |
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Fast Evaluation of Aberration-Induced Intensity Distribution in Partially Coherent Imaging Systems by Cross Triple Correlation |
| LIU Shi-Yuan1,2**, LIU Wei1, WU Xiao-Fei2
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1Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074
2State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074
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| Cite this article: |
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LIU Shi-Yuan, LIU Wei, WU Xiao-Fei 2011 Chin. Phys. Lett. 28 104212 |
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Abstract We propose a method suitable for the fast calculation and evaluation of aberration-induced intensity distribution in partially coherent imaging systems, such as projection lithographic tools. The method is based on transmission cross coefficient (TCC) decomposition by a general operator, namely cross triple correlation (CTC). By expanding the aberrated pupil function into a Taylor series, the TCC is decomposed into different terms. Each term is further represented as a weighted sum of several CTCs. By exploring the properties of CTC, the aerial image intensity induced by wavefront aberration is calculated quickly and separated clearly from that without aberration. Simulation results and discussion are presented.
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42.30.Va
42.15.Fr
42.30.Lr
85.40.Hp
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Received: 30 March 2011
Published: 28 September 2011
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| PACS: |
42.30.Va
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(Image forming and processing)
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42.15.Fr
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(Aberrations)
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42.30.Lr
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(Modulation and optical transfer functions)
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85.40.Hp
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(Lithography, masks and pattern transfer)
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[1] Smith B W and Schlief R 2000 Proc. SPIE 4000 294
[2] Yuan Q Y, Wang X Z, Qiu Z C, Wang F, Ma M Y and He L 2007 Opt. Express 15 15878
[3] Liu W, Liu S Y, Zhou T T and Wang L J 2009 Opt. Express 17 19278
[4] Liu W, Liu S Y, Shi T L and Tang Z R 2010 Opt. Express 18 20096
[5] Saleh B E A 1979 Opt. Acta 26 777
[6] Kintner E C 1978 Appl. Opt. 17 2747
[7] Yamazoe K 2010 J. Opt. Soc. Am. A 27 1311
[8] Liu S Y, Liu W and Zhou T T 2011 J. Micro/Nanolith. MEMS MOEMS 10 023007
[9] Flagello D G, Klerk J, Davies G, Rogoff R, Geh B, Arnz M, Wegmann U and Kraemer M 1997 Proc. SPIE 3051 672
[10] Lohmann A W and Wirnitzer B 1984 Proc. IEEE 72 889
[11] Hopkins H H 1953 Proc. R. Soc. London A 217 408
[12] Zernike F 1934 Physica 1 689
[13] Yu P, Qiu W and Pan D Z 2008 IEEE Trans. Semicond. Manuf. 21 638
[14] Pati Y C and Kailath T 1994 J. Opt. Soc. Am. A 11 2438
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