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Influence of Different Substrates on Laser Induced Damage Thresholds at 1064nm of Ta2O5 Films |
| XU Cheng1,2;MA Jian-Yong1,2;JIN Yun-Xia1;HE Hong-Bo1;SHAO Jian-Da1;FAN Zheng-Xiu1 |
| 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 2018002Graduate School of Chinese Academy of Sciences, Beijing 100049 |
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| Cite this article: |
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XU Cheng, MA Jian-Yong, JIN Yun-Xia et al 2008 Chin. Phys. Lett. 25 1321-1324 |
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Abstract Ta2O5 films are prepared on Si, BK7, fused silica, antireflection (AR) and high reflector (HR) substrates by electron beam evaporation method, respectively. Both the optical property and laser induced damage thresholds (LIDTs) at 1064nm of Ta2O5 films on different substrates are investigated before and after annealing at 673K for 12h. It is shown that annealing increases the
refractive index and decreases the extinction index, and improves the O/Ta ratio of the Ta2O5 films from 2.42 to 2.50. Moreover, the results show that the LIDTs of the Ta2O5 films are mainly correlated with three parameters: substrate property, substoichiometry defect in the films and impurity defect at the interface between the substrate and the films. Details of the laser induced damage models in different cases are discusse .
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| Keywords:
42.79.-e
68.60.-p
81.15.Ef
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Received: 16 January 2008
Published: 31 March 2008
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| PACS: |
42.79.-e
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(Optical elements, devices, and systems)
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68.60.-p
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(Physical properties of thin films, nonelectronic)
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81.15.Ef
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