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Preparation of a Waveguide Array in Flame Hydrolysis Deposited
GeO2-SiO2 Glasses by Excimer-Laser Irradiation |
WU Yuan-Da;XING Hua;ZHANG Le-Tian;LI Ai-Wu;YU Yong-Sen;ZHANG Yu-Shu |
Department of Electronics Engineering, Jilin University,
Changchun 130023 |
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Cite this article: |
WU Yuan-Da, XING Hua, ZHANG Le-Tian et al 2002 Chin. Phys. Lett. 19 1877-1879 |
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Abstract SiO2 glass films doped with GeO2 were prepared by the flame hydrolysis deposition method, then annealed at 1200°C. After exposure to high pressure hydrogen, the as-deposited films were irradiated with excimer laser pulses operated at 248 nm. The induced refractive index change (the growth of index change was 0.33%) was measured by a spectroscopic ellipsometer. A waveguide array has been written in the film by irradiation through a phase mask.
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Keywords:
78.20.Ci
78.20.Ek
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Published: 01 December 2002
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PACS: |
78.20.Ci
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(Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity))
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78.20.Ek
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(Optical activity)
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