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Implant Depth Influence on InGaAsP/InP Double Quantum Well Intermixing Induced by Phosphorus Ion Implantation |
| ZHAO Jie1;CHEN Jie1;WANG Yong-Chen1;HAN De-Jun2 |
| 1College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin 300074
2Key Laboratory for Radiation Beam and Materials Modification (Ministry of Education), Beijing Normal University, Beijing 100875 |
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| Cite this article: |
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ZHAO Jie, CHEN Jie, WANG Yong-Chen et al 2006 Chin. Phys. Lett. 23 919-921 |
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Abstract We investigate quantum well intermixing of a double-quantum-well structure caused by phosphorus ion implantation by means of photoluminescence (PL). The ion implantation is performed at the energy of 120keV with the dose ranging from 1×1011 to 1×1014/cm2. The rapid thermal annealing is performed at the temperature of 700°C for 30s under pure nitrogen protection. The PL measurement shows that the band gap blueshift is influenced by the depth of ion implantation. The blueshift of the upper well which is closer to the implanted vacancies is enhanced with the ion dose faster than that from a lower well under the lower dose implantation (<5×1011/cm2). When the ion dose is over 1012/cm2, the band gap blueshift from both the wells increases with the ion dose and finally the two peaks combine together as one peak, indicating that the ion implantation results in a total intermixing of both the quantum wells.
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| Keywords:
61.72.Vv
78.55.Et
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Published: 01 April 2006
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