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Direct Deposition of Polycrystalline Diamond Films on the Si( 100) Mirror Surface by Hot Filament Chemical Vapor Deposition
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| GAO Chunxiao;ZOU Guangtian;JIN Zengsun |
| State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023 |
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| Cite this article: |
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GAO Chunxiao, ZOU Guangtian, JIN Zengsun 1994 Chin. Phys. Lett. 11 317-320 |
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Abstract High quality diamond films have been deposited on Si(100) mirror surface without using any surface pretreatment such as abrasive diamond scratching, diamond-like carbon predeposition or oil treatment. The experiments are carried out in the hot filament chemical vapour deposition system by using the mixture of methane, hydrogen and oxygen. The films show the well-defined facets and are confirmed by Raman spectroscopy and scanning electron microscopy to be high quality diamond films. In this deposition process, higher substrate temperature, high filament temperature and oxygen addition play the important roles in diamond nucleation on the mirror-smooth Si(100) surface.
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| Keywords:
81.15.Gh
81.40.-z
61.50.Cj
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Published: 01 May 1994
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| PACS: |
81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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81.40.-z
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(Treatment of materials and its effects on microstructure, nanostructure, And properties)
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61.50.Cj
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