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Field Emission Enhancement of Carbon Nanotubes by Surface Modification |
YONG Zhen-Zhong1,2;GONG Jin-Long1;WANG Zhen-Xia1;ZHU Zhi-Yuan1;HU Jian-Gang1,2;PAN Qiang-Yan1 |
1Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800
2Graduate School of the Chinese Academy of Sciences, Beijing 100049 |
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Cite this article: |
YONG Zhen-Zhong, GONG Jin-Long, WANG Zhen-Xia et al 2007 Chin. Phys. Lett. 24 233-235 |
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Abstract By employing a multi-walled carbon nanotube (MWCNT) film as the substrate, we obtain Fe tipped carbon nanorods or carbon nanoparticles grown on the outer walls of MWCNTs by combining sputtering deposition of Fe films and rf plasma enhanced chemical vapour deposition at high temperature. Scanning electron microscopy and high-resolution transmission electron microscopy are used to examine the structure of carbon nanorods and carbon nanoparticles. In addition, the formation mechanism is discussed briefly. The electron field emission tests indicate that the turn-on field (at 10μA/cm2) of the treated MWCNT films decreases from 2.4V/μm to 0.79V/μm and the field emission current is relatively stable. The enhanced field enhancement factor, increasing emission densities coming from the grown nanorods and nanoparticles, and H terminated by H plasma all are responsible for the enhancement of the field enhancement factor.
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Keywords:
79.70.+q
81.15.Gh
85.35.Kt
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Published: 01 January 2007
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PACS: |
79.70.+q
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(Field emission, ionization, evaporation, and desorption)
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81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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85.35.Kt
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(Nanotube devices)
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