Dust Charging in Electronegative SiH<suB>4</suB> Plasmas

Chin. Phys. Lett.

2005, Vol. 22

Issue (2): 405-408 DOI:

Original Articles

Dust Charging in Electronegative SiH₄ Plasmas

DUAN Ping^1,2;WANG Zheng-Xiong²;LIU Yue²;LIU Jin-Yuan²;WANG Xiao-Gang²

¹Department of Physics, Dalian University, Dalian 116622 ²State Key Laboratory of Materials Modification by Laser, Electron and Ion Beams, Dalian University of Technology, Dalian 116024

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DUAN Ping, WANG Zheng-Xiong, LIU Yue et al 2005 Chin. Phys. Lett. 22 405-408

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Abstract We theoretically investigate the dust charging in electronegative silane (SiH₄) plasmas, taking into account the effects of UV photodetachment. It is found that UV photodetachment could significantly lower the dust negative charge and even makes dust grains be positively charged under some special conditions. In addition, the other parameters, involving the negative ion and dust number densities, electron temperature and dust radius, have great effects upon the dust charging.

Keywords: 52.27.Lw 52.80.Tn

Published: 01 February 2005

PACS:	52.27.Lw	(Dusty or complex plasmas; plasma crystals)
	52.80.Tn	(Other gas discharges)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y2005/V22/I2/0405

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	DUAN Ping
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