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Model of Collisional Sheath in Spherical and Cylindrical Geometries for Plasma Source Ion Implantation |
| WANG De-zhen;YU Jiong;GONG Ye |
| The Key National Laboratory of Materials Modification by Three Beams, And Department of Physics, Dalian University of Technology, Dalian 116024 |
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| Cite this article: |
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WANG De-zhen, YU Jiong, GONG Ye 1996 Chin. Phys. Lett. 13 117-120 |
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Abstract A model is developed that describes the temporal evolution of the sheath during a pulse of high negative voltage applied to a spherical and cylindrical target in a plasma such as that present in plasma source ion implantation for the case in which the pressure of the neutral gas is large 4nough that the ion motion in the sheath can be assumed to he highly collisional. The analytic expressions of the sheath expanding ve1ocity are obtained. The positions of the sheath edge as a function of time predicted by the model are in agreement with those obtained by fluid equations.
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| Keywords:
52.40.Hf
52.25.-b
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Published: 01 February 1996
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| PACS: |
52.40.Hf
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(Plasma-material interactions; boundary layer effects)
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52.25.-b
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(Plasma properties)
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