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Measurement of Mg Content in Zn1-xMgxO Films by Electron Probe Microanalysis |
| YAN Feng-Ping1,2;JIAN Shui-Sheng1;WANG Lin1;Kenichi OGATA3;Kazuto KOIKE2;Shigehiko SASA2,3;Masatake INOUE2,3;Mitsuaki YANO2,3 |
| 1Institute of Lightwave Technology, Beijing Jiaotong University, Beijing 100044
2New Material Research Center, Osaka Institute of Technology, Asahi-ku, Ohmiya, 535-8585, Osaka, Japan
3Bio Venture Center, Osaka Institute of Technology, Asahi-ku, Ohmiya, 535-8585, Osaka, Japan |
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| Cite this article: |
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YAN Feng-Ping, JIAN Shui-Sheng, WANG Lin et al 2006 Chin. Phys. Lett. 23 313-315 |
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Abstract Zn1-xMgxO films are grown on A-sapphire substrates by molecular beam epitaxy, and Mg content in the Zn1-xMgxO films is measured by electron probe microanalysis (EPMA) when the acceleration voltage, the emission current, and the magnification are set to be 1kV, 30μA and 1000, respectively. The dead time is controlled within 17%--20% during the easurement with the receive angle of characteristic x-ray of 45°. The Mg content of the ZnMgO film is calculated by the low energy calibration and the ZAF calibration. By comparing the measurement result with the theoretical analysis and the EPMA result with the inductively coupled plasma (ICP), one can obtain that the measured value of Mg content of the samples is in good agreement with the theoretical analysis no matter whether the phase separation exists or not, and the correctness of ICP and EPMA is valid when Mg content in the samples is less than 0.5.
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| Keywords:
06.30.Dr
68.55.Ln
78.20.Ci
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Published: 01 February 2006
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06.30.Dr
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(Mass and density)
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68.55.Ln
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(Defects and impurities: doping, implantation, distribution, concentration, etc.)
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78.20.Ci
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(Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity))
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