Blue Light Emission from Hydrogenated Amorphous Silicon Carbide
Prepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System

Chin. Phys. Lett.

1996, Vol. 13

Issue (12): 947-949 DOI:

Original Articles

Blue Light Emission from Hydrogenated Amorphous Silicon Carbide Prepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System

MA Tian-fu;CHEN Kun-ji;DU Jia-fang;XU Jun;LI Wei;HUANG Xin-fan

National Laboratory of Solid State Microstructures and Department of Physics, Center for Advanced Studies in Science and Technology of Microstructures, Nanjing University, Nanjing 210093

Cite this article:

MA Tian-fu, CHEN Kun-ji, DU Jia-fang et al 1996 Chin. Phys. Lett. 13 947-949

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Abstract We chose xylene C₈H₁₀ as carbon source instead of conventional methane CH₄ to fabricate a-Si_l-xC_x: H films using plasma-enhanced chemial vapour deposition method. The optical band gap of this material could be widened to 3.1eV. And the infrared absorption spectra of our films manifest the existence of aromatic ring in them. Strong blue light emission with a peak wavelength of 490nm has been observed at room temperature.

Keywords: 78.66.Jg

Published: 01 December 1996

PACS:

78.66.Jg

(Amorphous semiconductors; glasses)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1996/V13/I12/0947

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	MA Tian-fu
	CHEN Kun-ji
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	XU Jun
	LI Wei
	HUANG Xin-fan

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