中国物理快报  2014, Vol. 31 Issue (09): 97301-097301    DOI: 10.1088/0256-307X/31/9/097301
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Effects of Pretreatment on the Electronic Properties of Plasma Enhanced Chemical Vapor Deposition Hetero-Epitaxial Graphene Devices
ZHANG Lian-Chang1**, SHI Zhi-Wen2, YANG Rong2, HUANG Jian1
1Department of Physics, Kunming University, Kunming 650214
2Beijing National Laboratory for Condensed Matter Physics, and Institute of Physics, Chinese Academy of Sciences, Beijing 100190