Analysis of X-Ray Photoelectron Spectroscopy of Polymethyl Methacrylate Etched by a KrF Excimer Laser
ZHU Xiao-Li, LIU Shi-Bing, CHEN Tao, JIANG Yi-Jian,ZUO Tie-Chuan
College of Laser Engineering, Beijing University of Technology, Beijing 100022
Analysis of X-Ray Photoelectron Spectroscopy of Polymethyl Methacrylate Etched by a KrF Excimer Laser
ZHU Xiao-Li;LIU Shi-Bing;CHEN Tao;JIANG Yi-Jian,ZUO Tie-Chuan
College of Laser Engineering, Beijing University of Technology, Beijing 100022
关键词 ：
78.66.Qn ,
78.55.Kz ,
79.60.-i
Abstract ： The C 1s and O 1s electrons in polymethyl methacrylate etched by different incident laser intensities are analysed by x-ray photoelectron spectroscopy. The results show that when the incident laser fluence increases gradually, the percentage of carbon atoms in C-C bonds decreases while the one in carbonyl group (C=O) and alkoxy group (C-O) increases, and the percentage of oxygen atoms in C=O bonds increases while the one in C--O bonds decreases. Based on the analysis of the chemical structure, the energy level transition, energy diversion, and dissociation of bonds are theoretically examined, which is consistent with the experimental results.
Key words ：
78.66.Qn
78.55.Kz
79.60.-i
出版日期: 2005-06-01
:
78.66.Qn
(Polymers; organic compounds)
78.55.Kz
(Solid organic materials)
79.60.-i
(Photoemission and photoelectron spectra)
引用本文:
ZHU Xiao-Li;LIU Shi-Bing;CHEN Tao;JIANG Yi-Jian;ZUO Tie-Chuan. Analysis of X-Ray Photoelectron Spectroscopy of Polymethyl Methacrylate Etched by a KrF Excimer Laser[J]. 中国物理快报, 2005, 22(6): 1526-1529.
链接本文:
https://cpl.iphy.ac.cn/CN/
或
https://cpl.iphy.ac.cn/CN/Y2005/V22/I6/1526
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