Interlayer Segregation of Cu Atoms in Metal Multilayers
YU Guang-Hua1, LI Ming-Hua1, ZHU Feng-Wu1, JIANG Hong-Wei2, LAI Wu-Yan2, CHAI Chun-Lin3
1Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
Interlayer Segregation of Cu Atoms in Metal Multilayers
1Department of Materials Physics, University of Science and Technology Beijing, Beijing 100083
2Institute of Physics, Chinese Academy of Sciences, Beijing 100080
3Institute of Semiconductor, Chinese Academy of Sciences, Beijing 100083
Abstract： The experimental results show that the exchange coupling field Hex of NiFe/FeMn for Ta/NiFe/FeMn/Ta multilayers is higher than that for the spin valve multilayers Ta/NiFe/Cu/NiFe/FeMn/Ta. The composition and chemical states at the surface of Ta(12 nm)/NiFe(7 nm), Ta(12 nm)/NiFe(7 nm)/Cu(4 nm) and Ta(12 nm)/NiFe(7 nm)/ Cu(3 nm)/NiFe(5 nm) were studied by using the x-ray photoelectron spectroscopy. The results show that no element from the underlayers floats out or segregate to the surface for Ta(12 nm)/NiFe(7 nm), Ta(12 nm)/NiFe(7 nm)/ Cu(4 nm). However, Cu atoms segregate to the surface of Ta(12 nm)/NiFe(7 nm)/Cu(3 nm)/NiFe(5 nm) multilayers, i.e. to the NiFe/FeMn interface for Ta/NiFe/Cu/NiFe/FeMn/Ta multilayers. The authors believe that the presence of Cu atoms at the interface of NiFe/FeMn is one of the important factors which will cause the exchange coupling field Hex of Ta/NiFe/FeMn/Ta multilayers to be higher than that of Ta/NiFe/Cu/NiFe/FeMn/Ta multilayers.
YU Guang-Hua;LI Ming-Hua;ZHU Feng-Wu;JIANG Hong-Wei;LAI Wu-Yan;CHAI Chun-Lin. Interlayer Segregation of Cu Atoms in Metal Multilayers[J]. 中国物理快报, 2001, 18(9): 1245-1248.
YU Guang-Hua, LI Ming-Hua, ZHU Feng-Wu, JIANG Hong-Wei, LAI Wu-Yan, CHAI Chun-Lin. Interlayer Segregation of Cu Atoms in Metal Multilayers. Chin. Phys. Lett., 2001, 18(9): 1245-1248.
2001, Vol. 18 
