Abstract： Adsorption of deuterated methanol (CH3 OD) on Si ( 111 ) surface has been studied at different temperatures by means of thermal desorption spectroscopy. For the adsorption temperature below 420°C, the desorption peak of hydrogen kept up almost unchanged at 510°C (±70°C). But the desorption peak temperature of hydrogen increased obviously for the adsorption temperature above 420°C. We have also found an interesting change in desorption energy of hydrogen.
WANG Zhuying;HUANG Hongwu;T. Hein*;K. D. Brzoska*. Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures[J]. 中国物理快报, 1991, 8(4): 199-202.
WANG Zhuying, HUANG Hongwu, T. Hein*, K. D. Brzoska*. Adsorption of CH3OD on Si(ll1) Surface at Different Temperatures. Chin. Phys. Lett., 1991, 8(4): 199-202.
1991, Vol. 8 
