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Formation for Bass-Relief Microprofiles Based on an Analytic Formulation |
| SHI Li-Fang;DONG Xiao-Chun;DENG Qi-Ling;LUO Xian-Gang;DU Chun-Lei |
| State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, PO Box 350, Chengdu 610209 |
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| Cite this article: |
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SHI Li-Fang, DONG Xiao-Chun, DENG Qi-Ling et al 2007 Chin. Phys. Lett. 24 2867-2869 |
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Abstract A method of fast design and fabrication for bass-relief micro-profiles is developed by using an analytic formulation to determine the exposure distribution. Based on an equivalent exposure threshold model, the formulation is simplified for the case of bass-relief profile corresponding to the smaller exposure dose. The mask function for a microlens array is designed without iteration involved by the analytic formulation. The experiment is performed to validate the method, and the fabrication result is obtained with the profile error less than 30nm (rms).
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| Keywords:
42.79.Bh
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Received: 15 June 2007
Published: 20 September 2007
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| PACS: |
42.79.Bh
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(Lenses, prisms and mirrors)
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