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High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection |
| WU Wen-Juan1;ZHU Jing-Tao1;WANG Zhan-Shan1;ZHANG Zhong1;WANG Feng-Li1;WANG Hong-Chang1;ZHANG Shu-Min1;XU Yao1;CHENG Xin-Bin1;WANG Bei1;LI Cun-Xia1;WU Yong-Rong1;QIN Shu-Ji1;CHEN Ling-Yan1;ZHOU Hong-Jun2;HUO Tong-Lin2 |
| 1Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092
2National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029 |
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| Cite this article: |
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WU Wen-Juan, ZHU Jing-Tao, WANG Zhan-Shan et al 2006 Chin. Phys. Lett. 23 2534-2537 |
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Abstract The high reflectance orders are used to improve the spectral resolution of Mo/Si multilayers. The multilayers for the first-, second- and third-order reflectance are designed and optimized, respectively. These multilayers are fabricated by using a directed current magnetron sputtering system, and the reflectivity is measured in an extreme ultraviolet range by synchrotron radiation. The experimental results show that the spectral resolution λ/Δλ (λ=14nm) increases from 24.6 for the first order to 66.6 for the third order.
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| Keywords:
68.65.Ac
81.15.Cd
95.85.Mt
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Published: 01 September 2006
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