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Enhancement of Atomic Rearrangement in Top Surface Layers by Low Energy Ions |
| MA Zhong-quan1;LIU Bai-xin2 |
| 1Functional Materials Laboratory, Department of Physics, Xinjiang University, Urumqi 830046
2Department of Materials Science and Engineering, Tsinghua University, Beijing 100084
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| Cite this article: |
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MA Zhong-quan, LIU Bai-xin 1998 Chin. Phys. Lett. 15 668-670 |
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Abstract Assuming rectilinear trajectories for the projectile into a solid surface, a specific expression for the “energy window” of the driving atoms in a monolayer has been derived for different ion-target systems, in which the atomic displacements occur primarily in the surface layer, while the subsurface layer is kept intact. The results obtained here are in good agreement with Brice et al.’s numerical estimations and close to experimental data for ion beam assisted depositions.
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| Keywords:
61.80.Jh
61.80.Lj
81.15.Jj
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Published: 01 September 1998
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| PACS: |
61.80.Jh
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(Ion radiation effects)
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61.80.Lj
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(Atom and molecule irradiation effects)
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81.15.Jj
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(Ion and electron beam-assisted deposition; ion plating)
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