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Effects of Alcohol Addition on the Deposition of Diamond Thick Films by dc Plasma Chemical Vapor Deposition Method |
BAI Yi-zhen;JIANG Zhi-gang;WANG Chun-lei;JIN Zeng-sun;LÜ Xian-yi;ZOU Guang-tian |
National Laboratory of Superhard Materials, Jilin University, Changchun 130023 |
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Cite this article: |
BAI Yi-zhen, JIANG Zhi-gang, WANG Chun-lei et al 1998 Chin. Phys. Lett. 15 228-229 |
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Abstract Diamond films have been deposited by dc plasma chemical vapor deposition method. The addition of alcohol in the resource gas largely increases the deposition rate. The effects of alcohol addition on deposition rate and film quality are analyzed by scanning electron microscopy and Raman spectrometry. The mechanism of experimental phenomena is discussed.
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Keywords:
81.15.Gh
68.55.Jk
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Published: 01 March 1998
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PACS: |
81.15.Gh
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(Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.))
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68.55.Jk
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