Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge

Chin. Phys. Lett.

1996, Vol. 13

Issue (4): 305-308 DOI:

Original Articles

Reactive Sputter Deposition of Carbon Nitride Films by Using Hollow-Cathode Discharge

ZHAO Jing;KANG Ning;XU Ji-ren

Institute of Physics, Chinese Academy of Sciences, Beijing 100080

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ZHAO Jing, KANG Ning, XU Ji-ren 1996 Chin. Phys. Lett. 13 305-308

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Abstract Carbon nitride films have been prepared by reactive sputtering using hollow cathode discharge. Auger spectra show that the nitrogen content is about 20-25at.% in the bulk. Infrared (IR) spectra display three broad absorption bands. After heating treatment, changes of IR spectra suggest that the nitrogen incorporating in the bonding network of amorphous is thermally stable and hydrogen content decreases.

Keywords: 81.15.Cd 52.75.Rx 68.55.-a

Published: 01 April 1996

PACS:	81.15.Cd	(Deposition by sputtering)
	52.75.Rx
	68.55.-a	(Thin film structure and morphology)

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https://cpl.iphy.ac.cn/ OR https://cpl.iphy.ac.cn/Y1996/V13/I4/0305

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