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Reactive Deposition Epitaxial Growth of β-FeSi2 Film on Si(001): in situ Observation by Reflective High Energy Electron Diffraction |
WANG Lianwei;LIN Chenglu;SHEN Qinwo;NI Rushan;ZOU Shichang |
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050 |
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Cite this article: |
WANG Lianwei, LIN Chenglu, SHEN Qinwo et al 1995 Chin. Phys. Lett. 12 613-616 |
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Abstract Reactive deposition epitaxial growth of β-FeSi2 film on Si(001) has been studied by in situ observation of reflective high energy electron diffraction. Metastable strained phase was observed at initial stages. Surface roughness due to the islanding was observed during the deposition. The existed great tendency to transform the alignment of the orientation of crystallites into random as the thickness of deposited iron increased.
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Keywords:
68.55.Bd
61.14.-x
68.55.Nq
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Published: 01 October 1995
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