Chin. Phys. Lett.  1995, Vol. 12 Issue (10): 613-616    DOI:
Original Articles |
Reactive Deposition Epitaxial Growth of β-FeSi2 Film on Si(001): in situ Observation by Reflective High Energy Electron Diffraction
WANG Lianwei;LIN Chenglu;SHEN Qinwo;NI Rushan;ZOU Shichang
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Metallurgy, Academia Sinica, Shanghai 200050
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WANG Lianwei, LIN Chenglu, SHEN Qinwo et al  1995 Chin. Phys. Lett. 12 613-616
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Abstract Reactive deposition epitaxial growth of β-FeSi2 film on Si(001) has been studied by in situ observation of reflective high energy electron diffraction. Metastable strained phase was observed at initial stages. Surface roughness due to the islanding was observed during the deposition. The existed great tendency to transform the alignment of the orientation of crystallites into random as the thickness of deposited iron increased.
Keywords: 68.55.Bd      61.14.-x      68.55.Nq     
Published: 01 October 1995
PACS:  68.55.Bd  
  61.14.-x  
  68.55.Nq (Composition and phase identification)  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y1995/V12/I10/0613
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WANG Lianwei
LIN Chenglu
SHEN Qinwo
NI Rushan
ZOU Shichang
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